Lakkapragada Suresh: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE Photomask Technology - San Jose, California, United States (Monday 12 September 2016)] Photomask Technology 2016 - Reticle decision center: a novel applications platform for enhancing reticle yield and productivity at 10nm technology and beyond

Kasprowicz, Bryan S., Buck, Peter D., Hwa, George, Bugata, Raj, Chiang, Kaiming, Lakkapragada, Suresh, Tolani, Vikram, Gopalakrishnan, Sandhya, Chen, Chun-Jen, Yang, Chin-Ting, Hsu, Sheng-Chang, Tuo,

Year:

2016

Language:

english

File:

PDF, 691 KB

english, 2016

2

Direct Measurement of the Effect of Surface Roughness on the Colloidal Forces between a Particle and Flat Plate

Lakkapragada Suresh, John Y. Walz

Journal:

Journal of Colloid and Interface Science

Year:

1997

Language:

english

File:

PDF, 272 KB

english, 1997

3

Effect of Surface Roughness on the Interaction Energy between a Colloidal Sphere and a Flat Plate

Lakkapragada Suresh, John Y. Walz

Journal:

Journal of Colloid and Interface Science

Year:

1996

Language:

english

File:

PDF, 672 KB

english, 1996

4

The Effect of Nanoscale Roughness on Long Range Interaction Forces

John Y. Walz, Lakkapragada Suresh, Martin Piech

Journal:

Journal of Nanoparticle Research

Year:

1999

Language:

english

File:

PDF, 203 KB

english, 1999

5

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Spectral scatterometry for 2D trench metrology of low-K dual-damascene interconnect

Ukraintsev, Vladimir A., Kulkarni, Mak, Baum, Christopher C., Kirmse, Karen, Guevremont, Marco, Lakkapragada, Suresh, Bhatia, Kamal N., Herrera, Pedro P., Whitney, Umar K., Herr, Daniel J. C.

Year:

2002

Language:

english

File:

PDF, 97 KB

english, 2002

6

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - Implementation of spectroscopic critical dimension (SCD) (TM) for gate CD control and stepper characterization

Allgair, John A., Benoit, David C., Drew, Jr., Mark, Hershey, Robert R., Litt, Lloyd C., Herrera, Pedro P., Whitney, Umar K., Guevremont, Marco, Levy, Ady, Lakkapragada, Suresh, Sullivan, Neal T.

Year:

2001

Language:

english

File:

PDF, 2.17 MB

english, 2001

7

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Automated Defect Classification (ADC) and Progression Monitoring (DPM) in wafer fab reticle requalification

Yen, T. H., Lai, Rick, Tuo, Laurent C., Tolani, Vikram, Chen, Dongxue, Hu, Peter, Yu, Jiao, Hwa, George, Zheng, Yan, Lakkapragada, Suresh, Wang, Kechang, Peng, Danping, Wang, Bill, Chiang, Kaiming, Fa

Year:

2013

Language:

english

File:

PDF, 5.63 MB

english, 2013

8

Study of the sedimentation of a single particle toward a flat plate

Walz, John Y., Suresh, Lakkapragada

Journal:

The Journal of Chemical Physics

Year:

1995

Language:

english

File:

PDF, 623 KB

english, 1995

9

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Improved gate process control at the 130-nm node using spectroscopic-ellipsometry-based profile metrology

Hodges, J. Scott, Lin, Yu-Lun C., Burrows, Dale R., Chiao, Ray H., Peters, Robert M., Rangarajan, Srinivasan, Bhatia, Kamal N., Lakkapragada, Suresh, Herr, Daniel J.

Year:

2003

Language:

english

File:

PDF, 339 KB

english, 2003

10

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Improved profile measurement accuracy via feed-forward spectroscopic ellipsometry

Peters, Robert M., Archie, Chas N., Lakkapragada, Suresh

Year:

2006

Language:

english

File:

PDF, 373 KB

english, 2006

11

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Improve mask inspection capacity with Automatic Defect Classification (ADC)

Wang, Crystal, Ho, Steven, Guo, Eric, Wang, Kechang, Lakkapragada, Suresh, Yu, Jiao, Hu, Peter, Tolani, Vikram, Pang, Linyong, Faure, Thomas B., Ackmann, Paul W.

Year:

2013

Language:

english

File:

PDF, 582 KB

english, 2013

12

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, USA (Tuesday 11 September 2012)] Photomask Technology 2012 - Computational defect review for wafer-fab reticle requal, part 1: mask plane inspections

Tolani, Vikram, Abboud, Frank E., Faure, Thomas B., Dai, Grace, Lakkapragada, Suresh, Hu, Peter, Wang, Kechang, He, Lin, Li, Ying, Peng, Danping, Hwa, George, Pang, Linyong

Year:

2012

Language:

english

File:

PDF, 1.31 MB

english, 2012

13

SPIE Proceedings [SPIE Optoelectronics and High-Power Lasers & Applications - San Jose, CA (Saturday 24 January 1998)] Flatness, Roughness, and Discrete Defects Characterization for Computer Disks, Wafers, and Flat Panel Displays II - Surface particle detection for the 0.07-μm generation and beyond

Buckner, Benjamin D., Suresh, Lakkapragada, Hirleman, E. Dan, Stover, John C.

Year:

1998

Language:

english

File:

PDF, 781 KB

english, 1998

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